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Novel High k Application Workshop 2016

In collaboration with the EU COST networking project HerALD, NaMLab invites to the Novel High-k Application Workshop on March 14th and 15th, 2016.

New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics will be discussed by more than 80 participants from industry, research institutes and universities. NaMLab created with the workshop a stimulating European platform for application-oriented scientist to exchange ideas and discuss latest experimental results on MIM-capacitors, process technology, leakage & reliability as well as characterization of high-k dielectrics integrated in silicon based micro– and nanoelectronics. In addition, new results in the field of ALD dielectrics in solar cells, tranparent conduction oxides (TCOs) and atomic layer etching (ALE) will be discussed.

see more details including preliminary agenda

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NaMLab gGmbH
Nöthnitzer Str. 64 a
01187 Dresden
Germany 

Phone: +49.351.21.24.990-00
Fax: +49.351.475.83.900

info (at) namlab.com

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NaMLab gGmbH is financed in parts by the Saxon State government out of the State budget approved by the Saxon State Parliament.

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