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High-k Workshop 2020

Save the Date: March 31th and April 1st, 2020 - NaMLab invites to the next Novel High-k Application Workshop in March 2020. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics were discussed by more than 100 participants from industry, research institutes and universities.

In this series of annual workshops NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss latest experimental results on MIM-capacitors, process technology, leakage & reliability as well as characterization of high-k dielectrics integrated in silicon based micro– and nanoelectronics. The ferroelectric properties of doped HfO2 and ZrO2 were discovered more than 10 years ago. On the second day of the workshop, root causes for the formation of this so far unknown phase will be discussed together with the application of these films.

Agenda: preliminary workshop agenda

Where: MPI PKS, Noethnitzer Strasse 38, Dresden

When: March 31th and April 1st, 2020   9 am - 5 pm

Accomodation: Pullman Dresden Newa Hotel, Prager Strasse, Dresden

                            Namlab rate: 74.80€ incl. breakfast; code: Namlab Workshop

                            for reservation:                     

Registration: please use the following link:

Conference proceedings: Ferroelectric HfO2 results can be published in a

                                             Appl. Phys. Letter Special Topic collection.

                                             Guest editors: T. Mikolajick, M.H. Park, U.Schroeder (details will follow)

Thank you for the support by:



Brief note: Our sponsor Oxford Instruments is organizing a pre-workshop related to their tools on March 30th, 2020 at NaMLab

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NaMLab gGmbH
Nöthnitzer Str. 64 a
01187 Dresden

Phone: +49.351.21.24.990-00
Fax: +49.351.475.83.900

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