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High-k Workshop 2019

NaMLab invited to the Novel High-k Application Workshop on June 11th and 12th, 2019. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics were discussed by more than 100 participants from industry, research institutes and universities. Thank you for coming to Dresden.

In this series of annual workshops NaMLab has created a stimulating platform for application-oriented scientists to exchange ideas and discuss latest experimental results on MIM-capacitors, process technology, leakage & reliability as well as characterization of high-k dielectrics integrated in silicon based micro– and nanoelectronics. The ferroelectric properties of doped HfO2 and ZrO2 were discovered more than 10 years ago. On the second day of the workshop, root causes for the formation of this so far unknown phase will be discussed together with the application of these films.

When: Jun 11, 2019 08:00 AM to Jun 12, 2019 06:00 PM

Where: MPI PKS, Noethnitzer Strasse 38, Dresden

Agenda overview: June 11th and 12th

 

Thank you for the support by:

 

Oxford

3eFerro

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Contact

NaMLab gGmbH
Nöthnitzer Str. 64 a
01187 Dresden
Germany 

Phone: +49.351.21.24.990-00
Fax: +49.351.475.83.900

info (at) namlab.com

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Wappen des Freistaates Sachsen


NaMLab gGmbH is financed in parts by the Saxon State government out of the State budget approved by the Saxon State Parliament.

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